LPKF Laser-induced-deep-etching (LIDE)

Posted by – June 25, 2018

LPKF Laser & Electronics demonstrated a laser-induced-deep-etching (LIDE) technology that overcomes the drawbacks of manufacturing processes by bringing cost-effective micro features of high aspect ratio and excellent quality to glass. In the display industry these LIDE-generated micro features can be used for vertical interconnects in backplanes (TVG) or for fine glass masks (FGMs) in OLED manufacturing. FGMS offer cost and quality advantages over today’s fine metal masks (FMMs).

Filmed at the I-Zone demo and prototype area at SID Display Week, the world’s largest and best exhibition for electronic information display technology.

Display Week’s I-Zone, sponsored by E Ink, is a unique exhibition-within-the-exhibition filled with demos and prototypes from around the world. Every year, dozens of applicants submit their pre-market and emerging products to compete for a free booth where they can share their inventions with buyers, manufacturers, potential partners, industry leaders and thousands of attendees.